Novel molecular resist based on a first generation dendrimer possessing furan rings

Macromolecular Rapid Communications

Volumn 27, Issue 20, 2006, Pages 1792-1796

  Mori, Hajime ^a   Nomura, Eisaku ^a,b   Hosoda, Asao ^a   Miyake, Yasuhito ^a   Taniguchi, Hisaji ^a  

^a INDUSTRIAL TECHNOLOGY CENTER OF WAKAYAMA PREFECTURE   (Japan)

^b WAKAYAMA NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Dendrimers; Furan; Lithography; Molecular resists

Indexed keywords

CROSSLINKING; DENDRIMERS; ELECTRON BEAM LITHOGRAPHY; SENSITIVITY ANALYSIS;

CROSSLINKERS; FUNCTIONAL GROUP; FURAN RINGS; MOLECULAR RESISTS;

FURAN RESINS;

EID: 33750709692     PISSN: 10221336     EISSN: 15213927     Source Type: Journal    
DOI: 10.1002/marc.200600454     Document Type: Article

References (21)

1. For example: [1a] R. D. Allen, T. I. Wallow, J. Opitz, R. A. Dipietro, R. Sooriyakumaran, P. Brock, G. Breyta, D. C. Hofer, S. Jayaraman, R. Vicari, K. A. Hullihen, L. F. Rhodes, B. L. Goodall, R. A. Shick, J. Photopolym. Sci. Technol. 1998, 11, 475;
2. [1b] JP 101819 (2004), Fuji Photo Film Co. Ltd., inv.: Y. Adegawa..
3. [2a] Y. Shirota, J. Mater. Chem. 2000, 10, 1;
4. [2b] Y. Shirota, J. Mater. Chem. 2005, 15, 75.
5. Dendrimers [3a] T. Kadota, H. Kageyama, F. Wakaya, K. Gamo, Y. Shirota, Chem. Lett. 2004, 33, 706;
6. [3b] T. Hirayama, D. Shiono, H. Hada, J. Onodera, M. Ueda, J. Photopolym. Sci. Technol. 2004, 17, 435;
7. [3c] J.-B. Kim, H.-J. Yun, Y.-G. Kwon, Chem. Lett. 2002, 33, 1064;
8. [3d] D. C. Tully, A. R. Trimble, J. M. J. Fréchet, Adv. Mater. 2000, 12, 1118;
9. [3e] T. Kadota, H. Kageyama, F. Wakaya, K. Gamo, Y. Shirota, J. Photopolym. Sci. Technol. 1999, 12, 375;
10. [3f] T. Kadota, H. Kageyama, F. Wakaya, K. Gamo, Y. Shirota, J. Photopolym. Sci. Technol. 1998, 11, 147;
11. [3g] M. Yoshiwa, H. Kageyama, F. Wakaya, M. Takai, K. Gamo, Y. Shirota, J. Photopolym. Sci. Technol. 1996, 9, 57;
12. [3h] M. Yoshiiwa, H. Kageyama, Y. Shirota, F. Wakaya, K. Gamo, M. Takai, Appl. Phys. Lett. 1996, 69, 2605.
13. Calixarene derivatives [4a] K. Young-Gil, J. B. Kim, T. Fujigaya, Y. Shibasaki, M. Ueda, J. Mater. Chem. 2002, 12, 53;
14. [4b] Y. Ochiai, S. Manako, J. Fujita, E. Nomura, J. Vac. Sci. Technol. 1999, 17, 933;
15. [4c] O. Haba, K. Haga, M. Ueda, Chem. Mater. 1999, 11, 427;
16. [4d] K. Takeshi, R. Nakayama, M. Ueda, Chem. Lett. 1998, 865;
17. [4e] T. Nakayama, K. Haga, O. Haba, M. Ueda, Chem. Lett. 1997, 265.
18. [5a] M. F. Gotta, H. Mayer, J. Org. Chem. 1998, 63, 9769;
19. [5b] M. Noji, T. Ohno, N. Futaba, H. Tajime, K. Ishii, J. Org. Chem. 2003, 68, 9340.
20. S. M. Lee, J. M. J. Fréchet, Macromolecules 1994, 27, 5160.
21. J. S. Moore, S. I. Stupp, Macromolecules 1990, 23, 2365.