Design and characteristics of acrylate polymers with alicyclic lactone group for ArF resists

Journal of Photopolymer Science and Technology

Volumn 19, Issue 6, 2006, Pages 699-703

  Maeda, Katsumi ^a   Nakano, Kaichiro ^a   Shirai, Masamitsu ^b  

^a NEC CORPORATION   (Japan)

^b Osaka Prefecture University   (Japan)

Author keywords

Acrylate polymer; Alicyclic lactone monomer; ArF excimer laser lithography; Chemically amplified positive resist; Dry etching durability

Indexed keywords

EID: 33846332058     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.19.699     Document Type: Article

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