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Volumn 155, Issue 2, 2008, Pages

Complete removal of copper contaminants on bare silicon surfaces by use of HCN aqueous solutions

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; CONCENTRATION (PROCESS); HYDROGEN PEROXIDE; IMPURITIES; METAL COMPLEXES; RATE CONSTANTS; SILICON; SOLUTIONS;

EID: 37549069357     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2816324     Document Type: Article
Times cited : (5)

References (31)
  • 5
    • 32044448706 scopus 로고    scopus 로고
    • 0167-9317 10.1016/j.mee.2005.09.008
    • K. -L. Ou, Microelectron. Eng. 0167-9317 10.1016/j.mee.2005.09.008, 83, 312 (2006).
    • (2006) Microelectron. Eng. , vol.83 , pp. 312
    • Ou, K.-L..1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.