Silicon surface wet cleaning and chemical oxide growth by a novel treatment in aqueous chlorine solutions

Electrochimica Acta

Volumn 49, Issue 21, 2004, Pages 3545-3553

  Chemla, M ^a   Durand Vidal, S ^a   Zanna, S ^b   Petitdidier, S ^c   Levy, D ^c  

^a SORBONNE UNIVERSITÉ   (France)

^b PSL RESEARCH UNIVERSITY   (France)

^c STMICROELECTRONICS   (France)

Author keywords

Electrochemical impedance; Silicon; Surface oxide; Wet cleaning

Indexed keywords

CHLORINE; CLEANING; CONTAMINATION; HYDROGEN PEROXIDE; SILICON; SOLUTIONS; SURFACE CHEMISTRY; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTROCHEMICAL IMPEDANCE; SURFACE OXIDES; WET CLEANING;

ELECTROCHEMISTRY;

EID: 2942597953     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2004.03.023     Document Type: Article

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