Reaction of cyanide ions with copper on Si surfaces and its use for Si cleaning

Surface Science

Volumn 600, Issue 5, 2006, Pages 1165-1169

  Liu, Yueh Ling ^a   Fujiwara, Naozumi ^a   Iwasa, Hitoo ^a   Takahashi, Masao ^a   Imai, Shigeki ^b   Kobayashi, Hikaru ^a  

^a OSAKA UNIVERSITY   (Japan)

^b SHARP CORPORATION   (Japan)

Author keywords

Cleaning; Copper; Defect passivation; Potassium cyanide; Silicon

Indexed keywords

COPPER; IMPURITIES; METHANOL; PASSIVATION; POTASSIUM COMPOUNDS; SILICA; SILICON; SOLUTIONS; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

DEFECT PASSIVATION; POTASSIUM CYANIDE;

SURFACE CLEANING;

EID: 33644603666     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.01.017     Document Type: Article

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