Integrity of copper-hafnium, hafnium nitride and multilayered amorphous-like hafnium nitride metallization under various thickness

Microelectronic Engineering

Volumn 83, Issue 2, 2006, Pages 312-318

  Ou, Keng Liang ^a  

^a TAIPEI MEDICAL UNIVERSITY   (Taiwan)

Author keywords

Amorphous like; Copper; Hafnium nitrides; Junction diodes

Indexed keywords

AMORPHOUS ALLOYS; ANNEALING; COPPER; COPPER ALLOYS; HAFNIUM ALLOYS; METALLIZING; MULTILAYERS; SPUTTERING; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS-LIKE; HAFNIUM NITRIDES; JUNCTION DIODES; TRANSMISSION ELECTRON MICROSCOPY (XTEM);

NITRIDES;

EID: 32044448706     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.09.008     Document Type: Article

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