Transient and stable species kinetics in pulsed cc-rf CF4/H 2 plasmas and their relation to surface processes

Journal of Physics D: Applied Physics

Volumn 40, Issue 23, 2007, Pages 7383-7391

  Gabriel, O ^a,b   Stepanov, S ^a   Meichsner, J ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; LASER TUNING; PARAMETER ESTIMATION; PLASMAS; PROCESS CONTROL; THIN FILMS;

ADDITIONAL PARAMETER; RADIO-FREQUENCY PLASMAS; RF DISCHARGE; SURFACE PROCESSES;

FLUOROCARBONS;

EID: 36349018798     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/23/020     Document Type: Article

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