Time resolved measurements of the CF2 rotational temperature in pulsed fluorocarbon rf plasmas

Plasma Sources Science and Technology

Volumn 15, Issue 4, 2006, Pages 858-864

  Gabriel, O ^a,b   Stepanov, S ^a   Pfafferott, M ^a   Meichsner, J ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; FLUOROCARBONS; INFRARED SPECTROGRAPHS; SEMICONDUCTOR LASERS; SURFACE TREATMENT;

INFRARED ABSORPTION SPECTROSCOPY; PLASMA CHEMICAL PROCESSES; PLASMA SURFACE INTERACTION; ROTATIONAL TEMPERATURE;

PLASMA DENSITY;

EID: 33750599751     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/15/4/032     Document Type: Article

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