Performance enhancement of ohmic contact on n-GaN using Ti-W as metal barrier

Materials Science and Engineering: B

Volumn 143, Issue 1-3, 2007, Pages 55-59

  Fernandez S ^a   Pena R ^a   Rodrigo, M T ^a   Verdu M ^a   Sanchez F J ^a   Montojo, M T ^a  

^a Laboratorio de Ensayos   (Spain)

Author keywords

Contact resistance; Metals; Surface morphology; Titanium tunsgten

Indexed keywords

ANNEALING; CONTACT RESISTANCE; GALLIUM; METAL ANALYSIS; METALLIZING; SURFACE MORPHOLOGY; TITANIUM;

LOW-RESISTANCE OHMIC CONTACT; OPTIMAL ANNEALING PARAMETERS; TITANIUM-TUNSGTEN;

OHMIC CONTACTS;

EID: 35348913633     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2007.07.004     Document Type: Article

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