Electrical, microstructural, and thermal stability characteristics of Ta/Ti/Ni/Au contacts to n-GaN

Journal of Applied Physics

Volumn 95, Issue 3, 2004, Pages 1516-1524

  Motayed, Abhishek ^a   Jones, Kenneth A ^b   Derenge, Michael A ^b   Wood, Mark C ^b   Zakharov, D N ^c   Liliental Weber, Z ^c   Smith, David J ^d   Davydov, Albert V ^e   Anderson, Wallace T ^f   Iliadis, Agis A ^g   Mohammad, S Noor ^a,f  

^a School of Engineering   (United States)

^b U S ARMY RESEARCH LABORATORY   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d ARIZONA STATE UNIVERSITY   (United States)

^e NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^f NAVAL RESEARCH LABORATORY   (United States)

^g UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; CRYSTAL MICROSTRUCTURE; CURRENT VOLTAGE CHARACTERISTICS; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; ENERGY DISPERSIVE SPECTROSCOPY; METALLIZING; OHMIC CONTACTS; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

LOW RESISTANCE OHMIC CONTACT; MICROSTRUCTURE ANALYSIS;

GALLIUM NITRIDE;

EID: 10744220340     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1633660     Document Type: Article

References (29)

1. J. S. Foresi and T. D. Moustakas, Appl. Phys. Lett. 62, 2859 (1993).
2. M. Asif Khan, M. S. Shur, and Q. Chen, Electron. Lett. 31, 2130 (1995).
3. N. A. Papanicolaou, A. Edwards, M. V. Rao, J. Mittereder, and W. T. Anderson, J. Appl. Phys. 87, 380 (2000).
4. T. Gressmann, T. L. Li, E. L. Waldron, J. W. Graff, E. F. Schubert, and J. K. Sheu, Appl. Phys. Lett. 80, 986 (2002).
5. B. P. Luther, S. E. Mohney, T. N. Jackson, M. A. Khan, Q. Chen, and J. W. Yang, Appl. Phys. Lett. 70, 57 (1997)
6. Q. Z. Liu and S. S. Lau, Solid-State Electron. 42, 677 (1998).
7. S. Heikman, S. Keller, S. P. DenBaars, and U. K. Mishra, Appl. Phys. Lett. 78, 2876 (2001).
8. J. Burm, K. Chu, W. A. Davis, W. J. Schaff, T. J. Eutis, and L. F. Eastman, Appl. Phys. Lett. 70, 464 (1997).
9. Z.-F. Fan, S. Noor Mohammad, W. Kim, O. Aktas, A. E. Botchkarev, and H. Morkoç, Appl. Phys. Lett. 68, 1672 (1996).
10. D.-F. Wang, F. Shiwei, C. Lu, A. Motayed, M. Jah, S. Noor Mohammad, K. A. Jones, and L. Salamanca-Riba, J. Appl. Phys. 89, 6214 (2001).
11. A. Motayed, R. Bathe, M. C. Wood, O. S. Diouf, R. D. Vispute, and S. Noor Mohammad, J. Appl. Phys. 93, 1087 (2003).
12. A. Motayed, A. V. Davydov, L. A. Bendersky, M. C. Wood, M. A. Derenge, D. F. Wang, K. A. Jones, and S. Noor Mohammad, J. Appl. Phys. 92, 5218 (2002).
13. C. Lu, H. Chen, X. Lv, X. Xie, and S. Noor Mohammad, J. Appl. Phys. 91, 9218 (2002).
14. D. Qiao, L. Jia, L. S. Yu, P. M. Asbeck, S. S. Lau, S.-H. Lim, Z. Liliental-Weber, T. E. Haynes, and J. B. Barner, J. Appl. Phys. 89, 5543 (2001).
15. S.-H. Lim, J. Washburn, Z. Liliental-Weber, and D. Qiao, Appl. Phys. Lett. 78, 3797 (2001).
16. S. Ruvimov, Z. Lilliental-Weber, J. Washburn, K. J. Duxstad, E. E. Haller, Z.-F. Fan, S. Noor Mohammad, W. Kim, O. Aktas, A. E. Botchkarev, and H. Morkoç, Appl. Phys. Lett. 69, 2582 (1996).
17. M. Suzuki, T. Kawakami, T. Arai, S. Kobayahsi, Y. Koide, T. Uemura, N. Shibata, and M. Murakami, Appl. Phys. Lett. 74, 275 (1998).
18. H. Ishikawa, S. Kobayashi, and Y. Koide, J. Appl. Phys. 81, 1315 (1997).
19. Handbook of Thermionic Properties, edited by V. S. Fomrenko and G. V. Samsonor (Plenum, New York, 1966)
20. T. C. Shen, G. B. Gao, and H. Morkoç, J. Vac. Sci. Technol. B 10, 2113 (1992).
21. Y. Kasukabe, J. Vac. Sci. Technol. A 15, 1848 (1997).
22. L. B. Pankratz, J. M. Stuve, and N. A. Gokcen, Thermodynamic Data for Mineral Technology (Bureau of Mines, Washington, DC, 1984), p. 355.
23. A. Motayed and S. Noor Mohammad (unpublished).
24. Z. Liliental-Weber, Y. Chen, S. Ruvimov, and J. Washburn, Phys. Rev. Lett. 79, 2835 (1997).
25. D. N. Zakharov, Z. Liliental-Weber, A. Motayed, and S. Noor Mohammad, Mater. Res. Soc. Symp. Proc. 764, C3.17.1 (2003).
26. R. Brydson, L. A. J. Garvie, A. J. Cravent, H. Sauer, F. Hofer, and G. Cressey, J. Phys.: Condens. Matter 5, 9379 (1993).
27. Y. Wu, W. Jiang, B. Keller, S. Keller, D. Kapolnek, S. DenBaars, and U. K. Mishra, Proceedings of the Workshop on III-V Nitrides, Nagoya, Japan (1995).
28. M. H. Tsai, S. C. Sun, H. T. Chiu, C. E. Tsai, and S. H. Chuang, Appl. Phys. Lett. 67, 1128 (1995).
29. B. P. Luther, S. E. Mohney, and R. F. Karlicek, Proceedings of the 39th Electronic Materials Conference, Fort Collins, CO, 25-27 June (1997).