Anatomy-performance correlation in Ti-based contact metallizations on AlGaNGaN heterostructures

Journal of Applied Physics

Volumn 101, Issue 3, 2007, Pages

  Mohammed, Fitih M ^b   Wang, Liang ^b   Koo, Hyung Joon ^b   Adesida, Ilesanmi ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

ANATOMY PERFORMANCE CORRELATION; CONTACT METALLIZATIONS; LOW RESISTANCE OHMIC CONTACT FORMATION; METAL BARRIER LAYERS;

ALUMINUM ALLOYS; ELECTRIC PROPERTIES; HETEROJUNCTIONS; OHMIC CONTACTS; SCANNING ELECTRON MICROSCOPY; TIN ALLOYS;

METALLIZING;

EID: 33847123988     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2433765     Document Type: Article

References (29)

1. A. N. Bright, P. J. Thomas, M. Weyland, D. M. Tricker, C. J. Humphreys, and R. Davies, J. Appl. Phys. 89, 3143 (2001).
2. Q. Z. Liu and S. S. Lau, Solid-State Electron. 42, 677 (1998).
3. S. Ruvimov, Appl. Phys. Lett. 69, 1556 (1996).
4. R. C. Fitch, J. Vac. Sci. Technol. B 22, 619 (2004).
5. Q. Z. Liu, L. S. Yu, F. Deng, S. S. Lau, Q. Chen, J. W. Yang, and M. A. Khan, Appl. Phys. Lett. 71, 1658 (1997).
6. R. C. Glass, L. M. Spellman, and R. F. Davis, Appl. Phys. Lett. 59, 2868 (1991).
7. D. W. Jenkins and J. D. Dow, Phys. Rev. B 39, 3317 (1989).
8. Z. F. Fan, S. N. Mohammad, W. Kim, O. Aktas, A. E. Botchkarev, and H. Morkoc, Appl. Phys. Lett. 68, 1672 (1996).
9. D. F. Wang, S. W. Feng, C. Lu, A. Motayed, M. Jah, S. N. Mohammad, K. A. Jones, and L. Salamanca-Riba, J. Appl. Phys. 89, 6214 (2001).
10. E. F. Chor, D. Zhang, H. Gong, G. L. Chen, and T. Y. F. Liew, J. Appl. Phys. 90, 1242 (2001).
11. S. J. Cai, R. Li, Y. L. Chen, L. Wong, W. G. Wu, S. G. Thomas, and K. L. Wang, Electron. Lett. 34, 2354 (1998).
12. V. Kumar, L. Zhou, D. Selvanathan, and I. Adesida, J. Appl. Phys. 92, 1712 (2002).
13. V. Reddy, S. H. Kim, and T. Y. Seong, J. Electron. Mater. 33, 395 (2004).
14. R. C. Fitch, Appl. Phys. Lett. 84, 1495 (2004).
15. T. Nakayama, H. Miyamoto, Y. Ando, Y. Okamoto, T. Inoue, K. Hataya, and M. Kuzuhara, Appl. Phys. Lett. 85, 3775 (2004).
16. F. M. Mohammed, L. Wang, D. Selvanathan, H. Hu, and I. Adesida, J. Vac. Sci. Technol. B 23, 2330 (2005).
17. L. Wang, F. M. Mohammed, and I. Adesida, Appl. Phys. Lett. 87, 141915 (2005).
18. F. M. Mohammed, L. Wang, I. Adesida, and E. Piner, J. Appl. Phys. 100, 023708 (2006).
19. H. Okamoto, Desk Handbook: Phase Diagrams For Binary Alloys (ASM International, Materials Park, OH, 2000).
20. B. Van Daele, G. Van Tendeloo, W. Ruythooren, J. Derluyn, M. R. Leys, and M. Germain, Appl. Phys. Lett. 87, 061908 (2005).
21. R. Li, IEEE Electron Device Lett. 20, 323 (1999).
22. V. Tilak, Mater. Res. Soc. Symp. Proc. 622, T741 (2000).
23. Z. X. Qin, Z. Z. Chen, Y. Z. Tong, X. M. Ding, X. D. Hu, T. J. Yu, and G. Y. Zhang, Appl. Phys. A: Mater. Sci. Process. 78, 729 (2004).
24. B. P. Luther, J. M. DeLucca, S. E. Mohney, and R. F. Karlicek, Appl. Phys. Lett. 71, 3859 (1997).
25. C. T. Lee and H. W. Kao, Appl. Phys. Lett. 76, 2364 (2000).
26. L. Wang, F. M. Mohammed, and I. Adesida, J. Appl. Phys. 101, 013702 (2007).
27. S. Miura, K. Ohkubo, Y. Terada, Y. Kimura, Y. Mishima, Y. Yamabe-Mitarai, H. Harada, and T. Mohri, J. Alloys Compd. 393, 239 (2005).
28. G. Petzow and G. Effenberg, Ternary Alloys: A Comprehensive Compendium of Evaluated Constitutional Data and Phase Diagrams (VCH, Weinheim, 1988).
29. R. Pretorius, A. M. Vredenberg, F. W. Saris, and R. Dereus, J. Appl. Phys. 70, 3636 (1991).