메뉴 건너뛰기




Volumn 51, Issue 9, 2007, Pages 1194-1200

Analysis of uniaxial and biaxial strain impact on the linearity of fully depleted SOI nMOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

HARMONIC DISTORTION; SATURATION (MATERIALS COMPOSITION); SILICON ON INSULATOR TECHNOLOGY; STRAIN; TRANSISTORS; TRIODES;

EID: 34548561809     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2007.07.016     Document Type: Article
Times cited : (4)

References (26)
  • 1
    • 0038417865 scopus 로고    scopus 로고
    • Strained Si CMOS (SS CMOS) technology: opportunities and challenges
    • Rim K., Anderson R., Boyd D., Cardone F., Chan K., Chen H., et al. Strained Si CMOS (SS CMOS) technology: opportunities and challenges. Solid-State Electron 47 7 (2003) 1133-1139
    • (2003) Solid-State Electron , vol.47 , Issue.7 , pp. 1133-1139
    • Rim, K.1    Anderson, R.2    Boyd, D.3    Cardone, F.4    Chan, K.5    Chen, H.6
  • 3
    • 19044392028 scopus 로고    scopus 로고
    • Enhancement of electron mobility in ultrathin-body silicon-on-insulator MOSFETs with uniaxial strain
    • Lauer I., and Antoniadis D. Enhancement of electron mobility in ultrathin-body silicon-on-insulator MOSFETs with uniaxial strain. IEEE Electron Dev Lett 26 5 (2005) 314-316
    • (2005) IEEE Electron Dev Lett , vol.26 , Issue.5 , pp. 314-316
    • Lauer, I.1    Antoniadis, D.2
  • 4
    • 33646947044 scopus 로고    scopus 로고
    • Mechanical and electrical analysis of strained liner effect in 35 nm fully depleted silicon-on-insulator devices with ultra thin silicon channels
    • Gallon C., Fenouillet-Beranger C., Denorme S., Boeuf F., Fiori V., Loubet N., et al. Mechanical and electrical analysis of strained liner effect in 35 nm fully depleted silicon-on-insulator devices with ultra thin silicon channels. Japanese J Appl Phys 45 4B (2006) 3058-3063
    • (2006) Japanese J Appl Phys , vol.45 , Issue.4 B , pp. 3058-3063
    • Gallon, C.1    Fenouillet-Beranger, C.2    Denorme, S.3    Boeuf, F.4    Fiori, V.5    Loubet, N.6
  • 5
    • 33645648324 scopus 로고    scopus 로고
    • Effect of tensile uniaxial stress on the electron transport properties of deep scaled FD-SOI n-type MOSFETs
    • Nayfeh H.M., Singh D.V., Hegenrother J.M., Sleight J.W., Ren Z., Dokumaci O., et al. Effect of tensile uniaxial stress on the electron transport properties of deep scaled FD-SOI n-type MOSFETs. IEEE Electron Dev Lett 27 4 (2006) 288-290
    • (2006) IEEE Electron Dev Lett , vol.27 , Issue.4 , pp. 288-290
    • Nayfeh, H.M.1    Singh, D.V.2    Hegenrother, J.M.3    Sleight, J.W.4    Ren, Z.5    Dokumaci, O.6
  • 6
    • 33646076449 scopus 로고    scopus 로고
    • Processing aspects in the low-frequency noise of nMOSFETs on strained-silicon substrates
    • Simoen E., Eneman G., Verheyen P., Loo R., De Meyer K., and Claeys C. Processing aspects in the low-frequency noise of nMOSFETs on strained-silicon substrates. IEEE Trans Electron Dev 53 5 (2006) 1039-1047
    • (2006) IEEE Trans Electron Dev , vol.53 , Issue.5 , pp. 1039-1047
    • Simoen, E.1    Eneman, G.2    Verheyen, P.3    Loo, R.4    De Meyer, K.5    Claeys, C.6
  • 8
    • 0038156178 scopus 로고    scopus 로고
    • High-performance strained-SOI CMOS devices using thin film SiGe-on-insulator technology
    • Mizuno T., Sugiyama N., Tezuka T., Numata T., and Takagi S. High-performance strained-SOI CMOS devices using thin film SiGe-on-insulator technology. IEEE Trans Electron Dev 50 4 (2003) 988-994
    • (2003) IEEE Trans Electron Dev , vol.50 , Issue.4 , pp. 988-994
    • Mizuno, T.1    Sugiyama, N.2    Tezuka, T.3    Numata, T.4    Takagi, S.5
  • 10
    • 0036564670 scopus 로고    scopus 로고
    • Linearity and low-noise performance of SOI MOSFETs for RF applications
    • Adan A., Yoshimasu T., Shitara S., Tanba N., and Fukumi M. Linearity and low-noise performance of SOI MOSFETs for RF applications. IEEE Trans Electron Dev 49 5 (2002) 881-888
    • (2002) IEEE Trans Electron Dev , vol.49 , Issue.5 , pp. 881-888
    • Adan, A.1    Yoshimasu, T.2    Shitara, S.3    Tanba, N.4    Fukumi, M.5
  • 12
    • 33751395916 scopus 로고    scopus 로고
    • Andrieu F, Ernst T, Faynot O, Rozeau O, Bogumilowicz Y, Hartmann J-M, et al. In-depth study of strained SGOI nMOSFETs down to 30 nm gate length. In: Proceedings of ESSDERC 2005. p. 297-300.
  • 13
    • 33751401551 scopus 로고    scopus 로고
    • Augendre E, Eneman G, De Keersgieter A, Simons V, De Wolf I, Ramos J, et al. On the scalability of source/drain current enhancement in thin film sSOI. In: Proceedings of ESSDERC 2005. p. 301-4.
  • 14
    • 0042594432 scopus 로고    scopus 로고
    • New approach for the gate current source-drain partition modeling in advanced MOSFETs
    • Romanjek K., Lime F., Ghibaudo G., and Leroux C. New approach for the gate current source-drain partition modeling in advanced MOSFETs. Solid-State Electron 47 10 (2003) 1657-1661
    • (2003) Solid-State Electron , vol.47 , Issue.10 , pp. 1657-1661
    • Romanjek, K.1    Lime, F.2    Ghibaudo, G.3    Leroux, C.4
  • 15
  • 17
    • 4544340565 scopus 로고    scopus 로고
    • Integral function method for determination of nonlinear harmonic distortion
    • Cerdeira A., Alemán M., Estrada M., and Flandre D. Integral function method for determination of nonlinear harmonic distortion. Solid-State Electron 48 12 (2004) 2225-2234
    • (2004) Solid-State Electron , vol.48 , Issue.12 , pp. 2225-2234
    • Cerdeira, A.1    Alemán, M.2    Estrada, M.3    Flandre, D.4
  • 18
    • 28444473028 scopus 로고    scopus 로고
    • Iniguez B, Picos R, Kwon I, Shur M S, Fjeldly T A, Lee K. Compact MOSFET modeling for harmonic distortion analysis. In: Proceedings of the fifth IEEE international caracas conference on devices, circuits and systems 2004. p. 111-7.
  • 19
    • 0031270536 scopus 로고    scopus 로고
    • Effect of gate-field dependent mobility degradation on distortion analysis in MOSFETs
    • Langevelde R., and Klaassen F.M. Effect of gate-field dependent mobility degradation on distortion analysis in MOSFETs. IEEE Trans Electron Dev 44 11 (1997) 2044-2052
    • (1997) IEEE Trans Electron Dev , vol.44 , Issue.11 , pp. 2044-2052
    • Langevelde, R.1    Klaassen, F.M.2
  • 20
    • 0028515113 scopus 로고
    • Systematic distortion analysis for MOSFET integrators with use of a New MOSFET model
    • Groenewold G., and Lubbers W. Systematic distortion analysis for MOSFET integrators with use of a New MOSFET model. IEEE Trans Circ Systems - II: Analog Digital Sig Process 41 9 (1994) 569-580
    • (1994) IEEE Trans Circ Systems - II: Analog Digital Sig Process , vol.41 , Issue.9 , pp. 569-580
    • Groenewold, G.1    Lubbers, W.2
  • 21
    • 31844456723 scopus 로고    scopus 로고
    • Pavanello M A, Cerdeira A, Alemán M A, Martino J A, Vancaillie L, Flandre D. Low temperature and channel engineering influence on the harmonic distortion of SOI NMOSFETs for analog applications. In: International symposium on SOI technology and devices XII PV2005-03, the electrochemical society proceedings series, Pennington, NJ; 2005. p. 125-30.
  • 22
    • 22144449577 scopus 로고    scopus 로고
    • Nonlinear performance comparison for FD and PD SOI MOSFETs based on the integral function method and volterra modeling
    • Parvais B., Cerdeira A., Schreurs D., and Raskin J.-P. Nonlinear performance comparison for FD and PD SOI MOSFETs based on the integral function method and volterra modeling. Int J Numer Model: Electron Network, Dev Field 18 4 (2005) 283-296
    • (2005) Int J Numer Model: Electron Network, Dev Field , vol.18 , Issue.4 , pp. 283-296
    • Parvais, B.1    Cerdeira, A.2    Schreurs, D.3    Raskin, J.-P.4
  • 24
    • 31744433629 scopus 로고    scopus 로고
    • Characterization and design methodology for low-distortion MOSFET-C analog structures in multithreshold deep-submicrometer SOI CMOS technologies
    • Vancaillie L., Kilchytska V., Alvarado J., Cerdeira A., and Flandre D. Characterization and design methodology for low-distortion MOSFET-C analog structures in multithreshold deep-submicrometer SOI CMOS technologies. IEEE Trans Electron Dev 53 2 (2006) 263-269
    • (2006) IEEE Trans Electron Dev , vol.53 , Issue.2 , pp. 263-269
    • Vancaillie, L.1    Kilchytska, V.2    Alvarado, J.3    Cerdeira, A.4    Flandre, D.5
  • 25
    • 0020919278 scopus 로고
    • Fully integrated active RC filters in MOS technology
    • Banu M., and Tsividis Y. Fully integrated active RC filters in MOS technology. IEEE J Solid-State Circ 18 6 (1983) 644-651
    • (1983) IEEE J Solid-State Circ , vol.18 , Issue.6 , pp. 644-651
    • Banu, M.1    Tsividis, Y.2
  • 26
    • 0022752950 scopus 로고
    • Modification of Banu-Tsividis continuous-time integrator
    • Czarnul Z. Modification of Banu-Tsividis continuous-time integrator. IEEE Trans Circ Syst 33 7 (1986) 714-716
    • (1986) IEEE Trans Circ Syst , vol.33 , Issue.7 , pp. 714-716
    • Czarnul, Z.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.