메뉴 건너뛰기




Volumn 26, Issue 5, 2005, Pages 314-316

Enhancement of electron mobility in ultrathin-body silicon-on-insulator MOSFETs with uniaxial strain

Author keywords

Mobility; MOSFET; Silicon on insulator (SOI) technology; Ultrathin silicon

Indexed keywords

ELECTRON MOBILITY; ELECTRON TRANSPORT PROPERTIES; ELECTROSTATICS; QUANTUM ELECTRONICS; SILICON ON INSULATOR TECHNOLOGY; STRAIN; ULTRATHIN FILMS;

EID: 19044392028     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2005.846582     Document Type: Article
Times cited : (27)

References (12)
  • 1
    • 0032284102 scopus 로고    scopus 로고
    • "Device design considerations for double-gate, ground-plane, and single-gated ultrathin SOI MOSFET's at the 25 nm channel length generation"
    • H. S. P. Wong, D. J. Frank, and P. M. Solomon, "Device design considerations for double-gate, ground-plane, and single-gated ultrathin SOI MOSFET's at the 25 nm channel length generation," in IEDM Tech. Dig., 1998, pp. 407-410.
    • (1998) IEDM Tech. Dig. , pp. 407-410
    • Wong, H.S.P.1    Frank, D.J.2    Solomon, P.M.3
  • 2
    • 0029403828 scopus 로고
    • "Electron mobility behavior in extremely thin SOI MOSFET's"
    • Nov
    • J. H. Choi, Y. J. Park, and H. S. Min, "Electron mobility behavior in extremely thin SOI MOSFET's," IEEE Electron Device Lett., vol. 16, no. 11, pp. 527-529, Nov. 1995.
    • (1995) IEEE Electron Device Lett. , vol.16 , Issue.11 , pp. 527-529
    • Choi, J.H.1    Park, Y.J.2    Min, H.S.3
  • 3
    • 84886448137 scopus 로고    scopus 로고
    • "Subband structure engineering for performance enhancement of Si MOSFETs"
    • S. I. Takagi, J. Koga, and A. Toriumi, "Subband structure engineering for performance enhancement of Si MOSFETs," in IEDM Tech. Dig., 1997, pp. 219-222.
    • (1997) IEDM Tech. Dig. , pp. 219-222
    • Takagi, S.I.1    Koga, J.2    Toriumi, A.3
  • 6
    • 0035716644 scopus 로고    scopus 로고
    • "Experimental evidence of quantum-mechanical effects on low-field mobility, gate-channel capacitance, and threshold voltage of ultrathin body SOI MOSFETs"
    • K. Uchida, J. Koga, R. Ohba, T. Numata, and S. I. Takagi, "Experimental evidence of quantum-mechanical effects on low-field mobility, gate-channel capacitance, and threshold voltage of ultrathin body SOI MOSFETs," in IEDM Tech. Dig., 2001, pp. 633-636.
    • (2001) IEDM Tech. Dig. , pp. 633-636
    • Uchida, K.1    Koga, J.2    Ohba, R.3    Numata, T.4    Takagi, S.I.5
  • 7
    • 19044376687 scopus 로고    scopus 로고
    • West Lafayette, IN: Computational Electronics, Purdue Univ., Apr
    • S. Hasan, Schred 2.1. Tutorial. West Lafayette, IN: Computational Electronics, Purdue Univ., Apr. 2003.
    • (2003) Schred 2.1. Tutorial
    • Hasan, S.1
  • 8
    • 0034454471 scopus 로고    scopus 로고
    • "Low field mobility of ultrathin SOI N-and P-MOSFETs: Measurements and implications on the performance of ultra-short MOSFETs"
    • D. Esseni, M. Mastrapasqua, G. K. Celler, F. H. Baumann, C. Fiegna, L. Selmi, and E. Sangiorgi, "Low field mobility of ultrathin SOI N-and P-MOSFETs: measurements and implications on the performance of ultra-short MOSFETs," in IEDM Tech. Dig., 2000, pp. 671-674.
    • (2000) IEDM Tech. Dig. , pp. 671-674
    • Esseni, D.1    Mastrapasqua, M.2    Celler, G.K.3    Baumann, F.H.4    Fiegna, C.5    Selmi, L.6    Sangiorgi, E.7
  • 9
    • 0036927506 scopus 로고    scopus 로고
    • "Experimental study on carrier transport mechanism in ultrathin-body SOI n- and p-MOSFET's with SOI thickness less than 5 nm"
    • K. Uchida, H. Watanabe, A. Kinoshita, J. Koga, T. Numata, and S. I. Takagi, "Experimental study on carrier transport mechanism in ultrathin-body SOI n- and p-MOSFET's with SOI thickness less than 5 nm," in IEDM Tech. Dig., 2002, pp. 47-50.
    • (2002) IEDM Tech. Dig. , pp. 47-50
    • Uchida, K.1    Watanabe, H.2    Kinoshita, A.3    Koga, J.4    Numata, T.5    Takagi, S.I.6
  • 10
    • 0035696860 scopus 로고    scopus 로고
    • "Investigating the relationship between electron mobility and velocity in deeply scaled nMOS via mechanical stress"
    • Dec
    • A. Lochtefeld and D. A. Antoniadis, "Investigating the relationship between electron mobility and velocity in deeply scaled nMOS via mechanical stress," IEEE Electron Device Lett., vol. 22, no. 12, pp. 591-593, Dec. 2001.
    • (2001) IEEE Electron Device Lett. , vol.22 , Issue.12 , pp. 591-593
    • Lochtefeld, A.1    Antoniadis, D.A.2
  • 12
    • 19044393023 scopus 로고    scopus 로고
    • "Experimental study of biaxial and uniaxial strain effects on carrier mobility in bulk and ultrathin-body SOI MOSFETs"
    • K. Uchida, R. Zednik, C. H. Lu, H. Jagannathan, J. McVittie, P. McIntyre, and Y. Nishi, "Experimental study of biaxial and uniaxial strain effects on carrier mobility in bulk and ultrathin-body SOI MOSFETs," in IEDM Tech. Dig., 2004, pp. 229-232.
    • (2004) IEDM Tech. Dig. , pp. 229-232
    • Uchida, K.1    Zednik, R.2    Lu, C.H.3    Jagannathan, H.4    McVittie, J.5    McIntyre, P.6    Nishi, Y.7


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.