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Volumn 2005, Issue , 2005, Pages 297-300

In-depth study of strained SGOI nMOSFETs down to 30nm gate length

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; ELECTRON MOBILITY; OSCILLATIONS; SOLID STATE DEVICES; TRANSISTORS;

EID: 33751395916     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDER.2005.1546644     Document Type: Conference Paper
Times cited : (6)

References (17)
  • 4
    • 33751425533 scopus 로고    scopus 로고
    • Tokyo
    • F. Bœuf et al., in proc. of SSDM, pp. 16-17, Tokyo, 2004.
    • (2004) Proc. of SSDM , pp. 16-17
    • Bœuf, F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.