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Volumn 44, Issue 11, 1997, Pages 2044-2052

Effect of gate-field dependent mobility degradation on distortion analysis in MOSFET's

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISTORTION; ELECTRIC NETWORK ANALYSIS; ELECTRIC RESISTANCE; GATES (TRANSISTOR); SEMICONDUCTOR DEVICE MODELS;

EID: 0031270536     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.641382     Document Type: Article
Times cited : (79)

References (19)
  • 1
    • 0028515113 scopus 로고    scopus 로고
    • "Systematic distortion analysis for MOSFET integrators with use new MOSFET model,"
    • 41, pp. 569-580, Sept. 1994.
    • G. Groenewold and W. J. Lubbers, "Systematic distortion analysis for MOSFET integrators with use new MOSFET model," IEEE Trans. Circuits Syst.. vol. CAS-41, pp. 569-580, Sept. 1994.
    • IEEE Trans. Circuits Syst.. Vol. CAS
    • Groenewold, G.1    Lubbers, W.J.2
  • 2
    • 0028419635 scopus 로고    scopus 로고
    • "Analysis of nonlinearities in MOS floating resistor networks,"
    • vol. 141, no. 2, pp. 82-88, 1994.
    • G. Wilson and P. K. Chan, "Analysis of nonlinearities in MOS floating resistor networks," IEE Proc. Circuits Devices Syst.. vol. 141, no. 2, pp. 82-88, 1994.
    • IEE Proc. Circuits Devices Syst..
    • Wilson, G.1    Chan, P.K.2
  • 4
    • 0024178927 scopus 로고    scopus 로고
    • "On the universality of inversionlayer mobility in N- And P-channel MOSFET's," in
    • 1988, pp. 398-401.
    • S. Takagi, M. Iwase, and A. Toriumi, "On the universality of inversionlayer mobility in N- and P-channel MOSFET's," in IEDM Tech. Dig., 1988, pp. 398-401.
    • IEDM Tech. Dig.
    • Takagi, S.1    Iwase, M.2    Toriumi, A.3
  • 5
    • 0025430936 scopus 로고    scopus 로고
    • "Measurements and modeling of the n-channel MOSFET inversion layer mobility and device characteristics in the temperature range 60-300 K,"
    • vol. 37, pp. 1289-1300, May 1990.
    • C. -L. Huang and G. S. Gildenblat, "Measurements and modeling of the n-channel MOSFET inversion layer mobility and device characteristics in the temperature range 60-300 K," IEEE Trans. Electron Devices, vol. 37, pp. 1289-1300, May 1990.
    • IEEE Trans. Electron Devices
    • Huang, C.L.1    Gildenblat, G.S.2
  • 6
    • 0026205305 scopus 로고    scopus 로고
    • "Physical understanding of low-field carrier mobility in silicon MOSFET inversion layer,"
    • vol. 38, pp. 1905-1911, Aug. 1991.
    • K. Lee, J.-S. Choi, S.-P. Sim, and C.-K. Kirn, "Physical understanding of low-field carrier mobility in silicon MOSFET inversion layer," IEEE Trans. Electron Devices, vol. 38, pp. 1905-1911, Aug. 1991.
    • IEEE Trans. Electron Devices
    • Lee, K.1    Choi, J.-S.2    Sim, S.-P.3    Kirn, C.-K.4
  • 7
    • 0028747841 scopus 로고    scopus 로고
    • "On the universality of inversion layer mobility in Si MOSFET's: Part I-Effects of substrate impurity concentration,"
    • vol. 41, pp. 2357-2362, Feb. 1994.
    • S. Takagi, A. Toriumi, M. Iwase, and H. Tango, "On the universality of inversion layer mobility in Si MOSFET's: Part I-Effects of substrate impurity concentration," IEEE Trans. Electron Devices, vol. 41, pp. 2357-2362, Feb. 1994.
    • IEEE Trans. Electron Devices
    • Takagi, S.1    Toriumi, A.2    Iwase, M.3    Tango, H.4
  • 8
    • 0028742723 scopus 로고    scopus 로고
    • "On the universality of inversion Layer mobility in Si MOSFET's: Part II-Effects of surface orientation,"
    • vol. 41, pp. 2363-2368, Feb. 1994.
    • _, "On the universality of inversion Layer mobility in Si MOSFET's: Part II-Effects of surface orientation," IEEE Trans. Electron Devices, vol. 41, pp. 2363-2368, Feb. 1994.
    • IEEE Trans. Electron Devices
  • 9
    • 0000737464 scopus 로고    scopus 로고
    • "Self-consistent calculation of electron and hole inversion charges at silicon-silicon dioxide interfaces,"
    • vol. 59, no. 9, pp. 3175-3183, 1986.
    • C. Moglestue, "Self-consistent calculation of electron and hole inversion charges at silicon-silicon dioxide interfaces," J. Appl. Phys., vol. 59, no. 9, pp. 3175-3183, 1986.
    • J. Appl. Phys.
    • Moglestue, C.1
  • 10
    • 0022025576 scopus 로고    scopus 로고
    • "The classical versus the quantum mechanical model of mobility degradation due to the gate field in MOSFET inversion layers,"
    • 32, pp. 700-710, Mar. 1985.
    • M. S. Lin, "The classical versus the quantum mechanical model of mobility degradation due to the gate field in MOSFET inversion layers," IEEE Trans. Electron Devices, vol. ED-32, pp. 700-710, Mar. 1985.
    • IEEE Trans. Electron Devices, Vol. ED
    • Lin, M.S.1
  • 11
    • 0024121899 scopus 로고    scopus 로고
    • "A better understanding of the channel mobility of Si MOSFET's based on the physics of quantized subbands,"
    • vol. 35, pp. 2406-2411, Dec. 1988.
    • _, "A better understanding of the channel mobility of Si MOSFET's based on the physics of quantized subbands," IEEE Trans. Electron Devices, vol. 35, pp. 2406-2411, Dec. 1988.
    • IEEE Trans. Electron Devices
  • 12
    • 84858226627 scopus 로고    scopus 로고
    • "A mobility model for MOSFET device simulation,"
    • 4, pp. 265-268, 1988.
    • A. J. Walker and P. H. Woerlee, "A mobility model for MOSFET device simulation," J. Phys. Coll., vol. C4, pp. 265-268, 1988.
    • J. Phys. Coll., Vol. C
    • Walker, A.J.1    Woerlee, P.H.2
  • 13
    • 0024718364 scopus 로고    scopus 로고
    • "MOSFET electron inversion layer mobilities-A physically based semi-empirical model for a wide temperature range,"
    • vol. 36, pp. 1456-1463, Aug. 1989.
    • D. S. Jeon and D. E. Burk, "MOSFET electron inversion layer mobilities-A physically based semi-empirical model for a wide temperature range," IEEE Trans. Electron Devices, vol. 36, pp. 1456-1463, Aug. 1989.
    • IEEE Trans. Electron Devices
    • Jeon, D.S.1    Burk, D.E.2
  • 14
    • 0025957008 scopus 로고    scopus 로고
    • "A comprehensive model for inversion layer hole mobility for simulation of submicrometer MOSFET's,"
    • vol. 38, pp. 151-159, Jan. 1991.
    • V. M. Agostinelli, H. Shin, and A. F. Tasch, "A comprehensive model for inversion layer hole mobility for simulation of submicrometer MOSFET's," IEEE Trans. Electron Devices, vol. 38, pp. 151-159, Jan. 1991.
    • IEEE Trans. Electron Devices
    • Agostinelli, V.M.1    Shin, H.2    Tasch, A.F.3
  • 15
    • 0028312656 scopus 로고    scopus 로고
    • "Characterization and modeling of the nand p-channel MOSFET's inversion-layer mobility in the range 25-150 C,"
    • vol. 37, no. 1, pp. 97-103, 1994.
    • C.-L. Huang and N. D. Arora, "Characterization and modeling of the nand p-channel MOSFET's inversion-layer mobility in the range 25-150 C," Solid-State Electron., vol. 37, no. 1, pp. 97-103, 1994.
    • Solid-State Electron.
    • Huang, C.-L.1    Arora, N.D.2
  • 16
    • 0029405899 scopus 로고    scopus 로고
    • "Temperature-dependent hole and electron mobility models for CMOS circuit simulation,"
    • vol. 42, pp. 1956-1961, Nov. 1995.
    • K.-S. Min and K. Lee, "Temperature-dependent hole and electron mobility models for CMOS circuit simulation," IEEE Trans. Electron Devices, vol. 42, pp. 1956-1961, Nov. 1995.
    • IEEE Trans. Electron Devices
    • Min, K.-S.1    Lee, K.2
  • 18
    • 0030241665 scopus 로고    scopus 로고
    • "A novel technique to determine the gate and drain bias dependent series resistance in drain engineered MOSFET's using one single device,"
    • vol. 43, pp. 1478-1488, Sept. 1996.
    • J. A. M. Otten and F. M. Klaassen, "A novel technique to determine the gate and drain bias dependent series resistance in drain engineered MOSFET's using one single device," IEEE Trans. Electron Devices, vol. 43, pp. 1478-1488, Sept. 1996.
    • IEEE Trans. Electron Devices
    • Otten, J.A.M.1    Klaassen, F.M.2
  • 19
    • 0027611069 scopus 로고    scopus 로고
    • "A new technique for measuring MOSFET inversion layer mobility,"
    • vol. 40, pp. 1134-1139, June 1993.
    • C.-L. Huang, J. V. Faricelli, and N. D. Arora, "A new technique for measuring MOSFET inversion layer mobility," IEEE Trans. Electron Devices, vol. 40, pp. 1134-1139, June 1993.
    • IEEE Trans. Electron Devices
    • Huang, C.-L.1    Faricelli, J.V.2    Arora, N.D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.