Micro-machining of resists on silicon by proton beam writing

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 260, Issue 1, 2007, Pages 405-408

  Uchiya, Naoyuki ^a   Harada, Takuya ^a   Murai, Masato ^a   Nishikawa, Hiroyuki ^a   Haga, Junji ^b   Sato, Takahiro ^b   Ishii, Yasuyuki ^b   Kamiya, Tomihiro ^b  

^a SHIBAURA INSTITUTE OF TECHNOLOGY   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

Electroplating; Micro machining; Nanoimprint; PMMA; Proton beam writing; Resist; SU 8

Indexed keywords

ELECTROPLATING; ION BEAM LITHOGRAPHY; MICROMACHINING; POLYMETHYL METHACRYLATES; PROTON BEAMS; SCANNING; SCANNING ELECTRON MICROSCOPY; SILICON;

MICROBEAMS; PROTON BEAM WRITING; RESISTS;

PHOTORESISTS;

EID: 34249898334     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2007.02.053     Document Type: Article

References (25)

1. F. Watt, First International Workshop on Proton Beam writing, Book of abstracts, Singapore, July 2004.
2. van Kan J.A., Sanchez J.L., Xu B., Osipowicz T., and Watt F. Nucl. Instr. and Meth. B 148 (1999) 1085
3. van Kan J.A., Bettiol A.A., and Watt F. Appl. Phys. Lett. 83 8 (2003) 1629
4. Springham S.V., Osipowicz T., Sanchez J.L., Gan L.H., and Watt F. Nucl. Instr. and Meth. B 130 (1997) 155
5. Springham S.V., Osipowicz T., Sanchez J.L., Lee S., and Watt F. Proc. SPIE Int. Soc. Opt. Eng. 3183 (1997) 128
6. Bettiol A.A., Ansari K., Sum T.C., van Kan J.A., and Watt F. Proc. SPIE Int. Soc. Opt. Eng. 5347 (2004) 255
7. Osipowicz T., van Kan J.A., Sum T.C., Sanchez J.L., and Watt F. Nucl. Instr. and Meth. B 161 (2000) 83
8. Ansari K., Shao P.G., van Kan J.A., Bettiol A.A., and Watt F. Nucl. Instr. and Meth. B 231 (2005) 407
9. H. Lorenz et al., in: Proceedings of MME'96, Micro Mechanics Europe, Barcelona, Spain, October 1996.
10. Kamiya T., Suda T., and Tanaka R. Nucl. Instr. and Meth. B 104 (1995) 43
11. Sakai a T., Kamiya T., Oikawa M., Sato T., Tanaka A., and Ishii K. Nucl. Instr. and Meth. B 190 (2002) 271
12. Sakai T., Oikawa M., Sato T., Nagamine T., Moon H.D., Nakazato K., and Suzuki K. Nucl. Instr. and Meth. B 231 (2005) 112
13. van Kan J.A., Bettiol A.A., Wee B.S., Sum T.C., Tang S.M., and Watt F. Sensors Actuators A 92 (2001) 370
14. van Kan J.A., Sanchez J.L., Xu B., Osipowicz T., and Watt F. Nucl. Instr. and Meth. B 158 (1999) 179
15. Ansari K., van Kan J.A., Bettiol A.A., and Watt F. Appl. Phys. Lett. 85 3 (2004) 476
16. Ziegler J.F., Biersack J.P., and Littmark U. The Stopping and Range of Ions in Solids (1985), Pergamon Press, New York
17. Simcic J., Pelicon P., Rupnik Z., Mihelic M., Razpet A., Jenko D., and Macek M. Nucl. Instr. and Meth. B 241 (2005) 479
18. Suma T.C., Bettiol A.A., Venugopal Rao S., van Kan J.A., Ramam A., and Watt F. Proc. SPIE 5347 (2004) 160
19. Yoon Y.K., Park J.W., and Allen M.G. Proc. IEEE Microelectromech. Syst. 14 (2005) 886
20. Hirai Y., Harada S., Kikuta H., and Tanaka Y. J. Vac. Sci. Technol. B 20 6 (2002) 2867
21. Heidari B., Maximov I., and Montelius L. J. Vac. Sci. Technol. B 18 6 (2000) 3557
22. Pfeiffer K., Fink M., Ahrens G., Gruetzner G., Reuther F., Seekamp J., Zankovych S., Sotomayor Torres C.M., Maximov I., Beck M., Graczyk M., Montelius L., Schulz H., Scheer H.-C., and Steingrueber F. Microelectron. Eng. 61-62 (2002) 393
23. Taniguchi J., Tokano Y., Miyamoto I., Komuro M., and Hiroshima H. Nanotechnology 13 (2002) 592
24. Schulz H., Lyebyedyev D., Scheer H.-C., Pfeiffer K., Bleidiessel G., Grutzner G., and Ahopelto J. J. Vac. Sci. Technol. B 18 6 (2000) 3582
25. Guo L.J. J. Phys. D: Topical Rev. Appl. Phys. 37 (2004) R123