Imprint lithography for curved cross-sectional structure using replicated Ni mold

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2867-2871

  Hirai, Yoshihiko ^a   Harada, Satoshi ^a   Kikuta, Hisao ^a   Tanaka, Yoshio ^a   Okano, Masato ^b   Isaka, Satoshi ^c   Kobayasi, Michio ^c  

^a Osaka Prefecture University   (Japan)

^b OSAKA SCIENCE AND TECHNOLOGY CENTER   (Japan)

^c Hikifune Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED DESIGN; ELECTROFORMING; ELECTROLESS PLATING; NICKEL; OPTICAL DEVICES; OPTIMIZATION; POLYMETHYL METHACRYLATES; SUBSTRATES;

CURVED CROSS SECTIONAL STRUCTURE; IMPRINT LITHOGRAPHY;

ELECTRON BEAM LITHOGRAPHY;

EID: 0036883174     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1515305     Document Type: Article

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