Nanoimprint lithography at the 6 in. wafer scale

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3557-3560

  Heidari, Babak ^a,b   Maximov, Ivan ^a   Montelius, Lars ^a  

^a LUND UNIVERSITY   (Sweden)

^b Box 580   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROPLATING; MULTILAYERS; NICKEL PLATING; PLASMA ETCHING; SILICON WAFERS; SUBSTRATES;

NANOIMPRINT LITHOGRAPHY (NIL);

ELECTRON BEAM LITHOGRAPHY;

EID: 0034315130     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1326923     Document Type: Article

References (5)

1. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, J. Vac. Sci. Technol. B 14, 4129 (1996).
2. H. Tan, A. Gilbertson, and S. Chou, J. Vac. Sci. Technol. B 16, 3926 (1998).
3. X. Sun, L. Zhuang, W. Zhang, and S. Chou, J. Vac. Sci. Technol. B 16, 3922 (1998).
4. B. Heidari, I. Maximov, E.-L. Sarwe, and L. Montelius, J. Vac. Sci. Technol. B 17, 2961 (1999).
5. B. Cui, W. Wu, L. Kong, X. Sun, and S. Chou, J. Appl. Phys. 85, 5534 (1999).