Deep ion beam lithography for micromachining applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3183, Issue , 1997, Pages 128-137

  Springham, S V ^a   Osipowicz, T ^b   Sanchez, J L ^b   Lee, S ^a   Watt, F ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

DIBL; High aspect ratio; LIGA; Mask fabrication; MEMS; Micromachining

Indexed keywords

BEAM PLASMA INTERACTIONS; COMPOSITE MICROMECHANICS; ELECTRON BEAMS; FABRICATION; ION BEAMS; ION BOMBARDMENT; IONS; MACHINING; MASKS; MEMS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; PARTICLE BEAMS; THREE DIMENSIONAL; X RAY LITHOGRAPHY; X RAYS;

DEEP LITHOGRAPHIES; DIBL; DIVERSE RANGES; FOCUSED BEAMS; HIGH ASPECT-RATIO; HIGH ENERGY LIGHTS; LIGA; MASK FABRICATION; SECONDARY RADIATIONS; TECHNICAL PROBLEMS; THICK RESISTS;

ASPECT RATIO;

EID: 33645885446     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.280533     Document Type: Conference Paper

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