Design and fabrication of microlens and spatial filter array by self-alignment for maskless lithography systems

Journal of Microlithography, Microfabrication and Microsystems

Volumn 2, Issue 3, 2003, Pages 210-219

  Ren, Yang ^a   Kin Foong, Chan ^a   Zhiqiang, Feng ^a   Ishikawa, Akihito ^a   Wenhui, Mei ^a  

^a Ball Semiconductor Inc   (United States)

Author keywords

Digital mirror device; Mask; Microlens array; Microlithography; MOEMS; Pattern generator; Photolithography; Reticle; Ultraviolet

Indexed keywords

EID: 77950396910     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.584445     Document Type: Article

References (17)

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