Advanced photoresist technologies for microsystems

Journal of Micromechanics and Microengineering

Volumn 11, Issue 4, 2001, Pages 353-358

  O'Brien, J ^a   Hughes, P J ^a   Brunet, M ^a   O'Neill, B ^a   Alderman, J ^a   Lane, B ^a   O'Riordan, A ^a   O'Driscoll, C ^a  

^a UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTROPLATING; ETCHING; FABRICATION; METALLOGRAPHIC MICROSTRUCTURE; MICROMACHINING;

MICROMACHINING MICROSYSTEMS (MST);

PHOTORESISTS;

EID: 0035395336     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/11/4/312     Document Type: Article

References (15)

1. Resist technology for MEMS applications
2. EPON SU-8: A low-cost negative resist for MEMS
3. High aspect ratio UV photolithography for electroplated structures
4. Rapid prototyping of microfluidic switches in polydimethyl siloxane and their actuation by electro-osmotic flow
5. Soft lithography and microfabrication
6. New photoresist coating method for 3D structured wafers
7. Patterning of polyamide and metal in deep grooves
8. Eurosensors XIII
9. Photo-polymer microchannel technologies and applications
10. Microfludic manifolds by polymer hot embossing for μTas applications
11. Potentialities of a new positive photoresist for the realization of thick moulds