Fabrication of the 3-D SU-8 fine micromesh and electroplated Ni micromesh structures

Digest of Papers - Microprocesses and Nanotechnology 2004

Volumn , Issue , 2004, Pages 304-305

  Sato, Hironobu ^a   Houshi, Yoshitaka ^a   Otsuka, Toshiharu ^a   Shoji, Shuichi ^a  

^a WASEDA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROPLATING; FABRICATION; LITHOGRAPHY; NICKEL; OPTIMIZATION; PHOTORESISTORS; ULTRAVIOLET RADIATION;

BACKSIDE EXPOSURE; ELECTROMESH STRUCTURES; GLASS SUBSTRATES; LITHOGRAPHY CONDITIONS;

MICROELECTROMECHANICAL DEVICES;

EID: 23244452218     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/imnc.2004.245664     Document Type: Conference Paper

References (2)

1. Hironobu Sato, et al., Proc. MEMS 2003, pp. 223-226
2. Yong-Kyu Yoon, et al., Proc. MEMS 2003, pp. 227-230