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Volumn 601, Issue 2, 2007, Pages 362-375

Spectroscopic characterization of Ni films on sub-10-nm silica layers: Thermal metamorphosis and chemical bonding

Author keywords

Metal nanoparticles; Nanometer silica film; Scanning auger microscopy; Surface diffusion; Thermal chemistry; X ray photoelectron spectroscopy

Indexed keywords

ANNEALING; NICKEL COMPOUNDS; PHYSICAL PROPERTIES; SILICA; THERMAL EFFECTS;

EID: 33846056465     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.10.030     Document Type: Article
Times cited : (8)

References (69)
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    • R. Chau, M. Doczy, B. Doyle, P. Stokely, D. Lionberger, N. Paulson, 30 nm and 20 nm Physical Gate Length CMOS Transistors, Silicon Nanoelectronics Workshop in Kyoto, June 12, 2001.
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    • Charles Evans & Associates. Available from: .


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.