Molecular structure of interfaces formed with plasma-polymerized silica-like primer films: Part II. Characterization of the primer/metal interface using X-ray photoelectron spectroscopy in situ

Journal of Adhesion

Volumn 78, Issue 6, 2002, Pages 465-493

  Turner, R H ^a,b   Boerio, F J ^a  

^a University of Cincinnati   (United States)

^b PROCTER AND GAMBLE COMPANY   (United States)

Author keywords

A SiO2 defects; Aluminum; In situ X ray photoelectron spectroscopy; Interfacial analysis; Plasma polymerized films; Suboxide; Titanium

Indexed keywords

ALUMINUM; DEPOSITION; FILMS; MATHEMATICAL MODELS; MOLECULAR STRUCTURE; OXIDATION; PLASMA ETCHING; PLASMA POLYMERIZATION; SILICA; TITANIUM; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA DEPOSITION; PRIMER; SILICA LIKE PRIMER; SILICON SUBOXIDE;

INTERFACES (MATERIALS);

EID: 0042624817     PISSN: 00218464     EISSN: None     Source Type: Journal    
DOI: 10.1080/00218460213730     Document Type: Article

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