Growth study and theoretical investigation of the ultrathin oxide sio2-si heterojunction

Physical Review Letters

Volumn 83, Issue 10, 1999, Pages 2038-2041

  Demkov, Alexander A ^a   Sankey, Otto F ^b  

^a MOTOROLA INC   (United States)

^b ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; INTERFACES (MATERIALS); MOLECULAR DYNAMICS; OXIDATION; REACTION KINETICS; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE STRUCTURES; SILICA;

ULTRATHIN GATE OXIDES;

HETEROJUNCTIONS;

EID: 20644438449     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.83.2038     Document Type: Article

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