Nickel nanoparticles in silica glass fabricated by 60 keV negative-ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 222, Issue 1-2, 2004, Pages 114-122

  Amekura, H ^a   Kitazawa, H ^a   Umeda, N ^b   Takeda, Y ^a   Kishimoto, N ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

Enhancement of magnetic anisotropy; Ion implantation; Magnetic nanoparticle; Negative ion; Nickel; SiO2; Superparamagnetism

Indexed keywords

ABSORPTION; COOLING; HEAT TREATMENT; ION IMPLANTATION; MAGNETIC ANISOTROPY; MAGNETIZATION; NICKEL; PHASE SEPARATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SOLUBILITY; SUPERPARAMAGNETISM; TRANSMISSION ELECTRON MICROSCOPY;

ENHANCEMENT OF MAGNETIC ANISOTROPY; MAGNETIC NANOPARTICLES; SIO2; TUNNELING MAGNETIC RESISTANCE (TMR);

FUSED SILICA;

EID: 2642577660     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.01.214     Document Type: Article

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