Interface characterization and carrier transportation in metal/ Hf O2 /silicon structure

Journal of Applied Physics

Volumn 100, Issue 11, 2006, Pages

  Chiu, Fu Chien ^a  

^a MING CHUAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; ELECTRIC FIELDS; ELECTRON TUNNELING; HAFNIUM COMPOUNDS; INTERFACES (MATERIALS); SCHOTTKY BARRIER DIODES;

CARRIER TRANSPORTATION; INTERFACE CHARACTERIZATION; SCHOTTKY EMISSION;

MOS CAPACITORS;

EID: 33845795718     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2401657     Document Type: Article

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