A maskless wet etching silicon dioxide post-CMOS process and its application

Microelectronic Engineering

Volumn 83, Issue 11-12, 2006, Pages 2543-2550

  Dai, Ching Liang ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

CMOS; Microstructures; Post process

Indexed keywords

ETCHING; INSERTION LOSSES; MICROMACHINING; MICROSTRUCTURE; SILICA;

ISOLATION; MICROROTORS; RADIO FREQUENCY (RF) SWITCHES; WET ETCHING;

CMOS INTEGRATED CIRCUITS;

EID: 33751220249     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.06.006     Document Type: Article

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