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Volumn 73, Issue 3, 1999, Pages 243-251
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CMOS-compatible device for fluid density measurements fabricated by sacrificial aluminum etching
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Author keywords
[No Author keywords available]
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Indexed keywords
ALUMINUM;
APPROXIMATION THEORY;
CMOS INTEGRATED CIRCUITS;
COMPUTER SIMULATION;
DENSITY MEASUREMENT (SPECIFIC GRAVITY);
ETCHING;
FINITE ELEMENT METHOD;
MICROMACHINING;
SEMICONDUCTING SILICON;
TUBES (COMPONENTS);
SACRIFICIAL ALUMINUM ETCHING;
MICROSENSORS;
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EID: 0032667556
PISSN: 09244247
EISSN: None
Source Type: Journal
DOI: 10.1016/S0924-4247(98)00225-8 Document Type: Article |
Times cited : (21)
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References (9)
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