Gas-phase xenon difluoride etching of microsystems fabricated through the Mitel 1.5-μm CMOS process

Canadian Journal of Electrical and Computer Engineering

Volumn 25, Issue 1, 2000, Pages 35-41

  Muthukumaran, P ^a   Stiharu, I ^a   Bhat, R B ^a  

^a Gina Cody School of Engineering and Computer Science   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ETCHING; FLUORINE COMPOUNDS; INTEGRATED CIRCUIT MANUFACTURE; MICROACTUATORS; MICROSENSORS; PIEZOELECTRIC TRANSDUCERS; XENON;

MICROSYSTEMS TECHNOLOGY (MST);

MICROELECTROMECHANICAL DEVICES;

EID: 1642586684     PISSN: 08408688     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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