Mechanical and tribological properties of thin remote microwave plasma CVD a-Si:N:C films from a single-source precursor

Tribology Letters

Volumn 13, Issue 2, 2002, Pages 71-76

  Bielinski, Dariusz ^a   Wrobel, Aleksander M ^b   Walkiewicz Pietrzykowska, Agnieszka ^b  

^a LODZ UNIVERSITY OF TECHNOLOGY   (Poland)

^b CENTRE OF MOLECULAR AND MACROMOLECULAR STUDIES   (Poland)

Author keywords

Friction; H E; Hardness; RP CVD; Silicon carbonitride; Thin film

Indexed keywords

SILICON CARBON NITRIDE;

EID: 1342318144     PISSN: 10238883     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1020144313969     Document Type: Conference Paper

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