AFM-measured surface roughness of SU-8 structures produced by deep x-ray lithography

Journal of Micromechanics and Microengineering

Volumn 16, Issue 10, 2006, Pages 1975-1983

  Vora, K D ^a   Lochel, B ^b   Harvey, E C ^c   Hayes, J P ^c   Peele, A G ^a  

^a LA TROBE UNIVERSITY   (Australia)

^b HAHN MEITNER INSTITUT   (Germany)

^c SWINBURNE UNIVERSITY OF TECHNOLOGY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; ROUGHNESS MEASUREMENT; SURFACE ROUGHNESS; SYNCHROTRONS; THICKNESS MEASUREMENT; X RAY LITHOGRAPHY;

AUGER ELECTRON SCATTERING; HIGH ASPECT RATIO MICROSTRUCTURES; PENETRATION DEPTH; SIDEWALL ROUGHNESS;

MICROSTRUCTURE;

EID: 33748758472     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/16/10/009     Document Type: Article

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