Fabrication of HARM structures by deep-X-ray lithography using graphite mask technology

Microsystem Technologies

Volumn 6, Issue 3, 2000, Pages 94-98

  Coane, P ^a   Giasolli, R ^a   Ledger, S ^a   Lian, K ^b   Ling, Z ^b   Gottert J ^c  

^a LOUISIANA TECH UNIVERSITY   (United States)

^b LOUISIANA STATE UNIVERSITY   (United States)

^c KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012640030     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s005420050005     Document Type: Article

References (17)

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3. HARMST99 Workshop Programme, Internet address www.nrlm.go.jp/harmst99/pro/harmst99programmet-English.html
4. Khan Malek C; Jackson KH; Bonivert WD; Hruby J (1996) J Micromech Microeng 6: 228-235 and references therein
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11. Goodfellow Cambridge Limited, Cambridge, England, catalog 1995/1996
12. Harris C et al. (1999) Inexpensive and Rapid X-ray Mask for LIGA, J Microsyst Tech, in press
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14. Mölders N; Schilling PJ; Schoonmaker JM to be published
15. Mölders N; Schilling P private communications, detailed results to be published
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