First results in patterning of ultra high aspect ratio microstructures by a 4T wave length shifter at BESSY

Proceedings - International Conference on MEMS, NANO and Smart Systems, ICMENS 2003

Volumn , Issue , 2003, Pages 177-180

  Bednarzik, M ^a   Scheunemann, H U ^a   Barth, A ^a   Schondelmaier, D ^a   Loechel, B ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

Elementary particle vacuum; Magnetic fields; Magnetic separation; Magnetic switching; Microstructure; Performance evaluation; Resists; Storage rings; Testing; X ray lithography

Indexed keywords

ASPECT RATIO; LITHOGRAPHY; MAGNETIC FIELDS; MAGNETIC SEPARATION; MAGNETIC STORAGE; MAGNETISM; MASKS; MICROSTRUCTURE; POLYMETHYL METHACRYLATES; STORAGE RINGS; TESTING;

ELEMENTARY PARTICLE VACUUM; HIGH ASPECT RATIO; MAGNETIC SWITCHING; PATTERNING METHODS; PERFORMANCE EVALUATION; RESISTS; ULTRA-DEEP X-RAY LITHOGRAPHY; WAVE LENGTH SHIFTERS;

X RAY LITHOGRAPHY;

EID: 33748796730     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICMENS.2003.1221989     Document Type: Conference Paper

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