Modeling of secondary radiation damage in liga PMMA resist exposure

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4979, Issue , 2003, Pages 482-492

  Ting, Aili ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

LIGA; Resist exposure; Secondary radiation damage; Substrate metalization; Undercutting

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BOUNDARY LAYERS; ELECTRON EMISSION; ELECTRONS; FLUORESCENCE; INTERFACES (MATERIALS); METALLIZING; PHOTONS; POLYMETHYL METHACRYLATES; RADIATION DAMAGE; SUBSTRATES;

ABSORBER; PHOTOELECTRONS; SECONDARY RADIATION DAMAGE;

MICROMACHINING;

EID: 0041561285     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.478237     Document Type: Conference Paper

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