Calculation and experimental determination of the structure transfer accuracy in deep x-ray lithography

Journal of Micromechanics and Microengineering

Volumn 7, Issue 4, 1997, Pages 323-331

  Feiertag, G ^a   Ehrfeld, W ^a   Lehr, H ^a   Schmidt, A ^a   Schmidt, M ^a  

^a INSTITUT FÜR MIKROTECHNIK MAINZ GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTROMAGNETIC WAVE SCATTERING; FLUORESCENCE; MASKS; MEMBRANES; SUBSTRATES; SYNCHROTRON RADIATION;

HIGH ATOMIC NUMBER MATERIALS; PHOTOELECTRONS;

X RAY LITHOGRAPHY;

EID: 0031382524     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/7/4/008     Document Type: Article

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