Scum-free patterning of SU-8 resist for electroforming applications

Journal of Micromechanics and Microengineering

Volumn 15, Issue 1, 2005, Pages 130-135

  Agarwal, M ^a   Gunasekaran, R A ^a   Coane, P ^a   Varahramyan, K ^a  

^a LOUISIANA TECH UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTROPLATING; LITHOGRAPHY; MICROELECTROMECHANICAL DEVICES; MICROSTRUCTURE; NICKEL; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

HIGH-ASPECT RATIO MICROSTRUCTURES (HARMST); MICROELECROMECHANICAL SYSTEM (MEMS); SCUM-FREE PATTERNING; UV-LITHOGRAPHY;

ELECTROFORMING;

EID: 12344302063     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/15/1/020     Document Type: Article

References (18)

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