Surface roughness control by energy shift in deep X-ray lithography

Microsystem Technologies

Volumn 9, Issue 3, 2003, Pages 163-166

  Cheng, Y ^a   Chen, C N ^b,c   Chieng, C C ^c   Tseng, F G ^c   Sheu, J T ^b  

^a TSINGHUA UNIVERSITY   (China)

^b NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^c NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY SHIFT; PHOTOELECTRONS; PHOTON ENERGY;

ATOMIC FORCE MICROSCOPY; IRRADIATION; PHOTONS; SCATTERING; SURFACE ROUGHNESS; SYNCHROTRON RADIATION; X RAY LITHOGRAPHY;

X RAYS;

EID: 0037284607     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-002-0202-x     Document Type: Article

References (8)

1. Feiertag G; Ehfeld W; Lehr H; Schmidt A; Schmidt M (1997) Calculation and experimental determination of the structure transfer accuracy in deep X-ray lithography. J Micromech Microeng 7: 323-331
2. Moldovan N; Mancini DC; Divan R; Makarova OV; Peele A (2001) Side wall roughness in UDXRL. HARMST' 01, Book of Abstract, pp. 181-182, Baden-baden, Germany
3. Cheng Y; Shew BY; Lin CY; Wei DH (1999) Deep X-ray lithography developed at SRRC. Proc of NSC, Part A, Phys Sci Eng 24(4): 537-543
4. Cheng Y; Kuo NY; Su CH (1997) Dose distribution of synchrotron X-ray penetrating materials of low atomic numbers. Rev Sci Instrum 68(5): 2163-2166
5. Cheng Y; Lin CY; Wei DH; Loechel B; Gruetzner G (1999) Wall profile of thick photoresist generated via contact printing. IEEE J MEMS 8(1): 18-26
6. Cheng Y; Shew BY; Lin CY; Wei DH; Chyu MK (1999) Ultra-deep LIGA process. J Micromech Microeng 9: 58-63
7. Cheng Y; Shew BY; Lin CH; Chyu MK (2000) Concepts for creating ultra deep trenches using deep X-ray lithography. Sensors and Actuators 82: 205-209
8. Cheng Y; Shew BY; Chyu MK; Chen P-H (2001) Ultra-deep LIGA process and its applications. NIMA 467(8): 1192-1197