Process optimisation for compact, high aspect ratio SU-8 microstructures using x-ray lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6037, Issue , 2006, Pages

  Vora, K D ^a   Shew, B Y ^b   Harvey, E C ^c   Hayes, J P ^c   Peele, A G ^a  

^a LA TROBE UNIVERSITY   (Australia)

^b NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^c SWINBURNE UNIVERSITY OF TECHNOLOGY   (Australia)

Author keywords

Development rate; Dimensional error; Space to feature ratio; Taguchi optimisation; X ray lithography

Indexed keywords

DEVELOPMENT RATE; DIMENSIONAL ERROR; SPACE-TO-FEATURE RATIO; TAGUCHI OPTIMISATION; X-RAY LITHOGRAPHY;

ASPECT RATIO; MATHEMATICAL MODELS; MICROELECTROMECHANICAL DEVICES; X RAY LITHOGRAPHY; X RAY OPTICS;

MICROSTRUCTURE;

EID: 33645317077     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.638457     Document Type: Conference Paper

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