Fabrication of open-top microchannel plate using deep X-ray exposure mask made with silicon on insulator substrate

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 4102-4106

  Fujimura, Tsuyoshi ^a   Ikeda, Akihiro ^a   Etoh, Shin Ichi ^a   Hattori, Reiji ^a   Kuroki, Yukinori ^a   Chang, Suk Sang ^b  

^a KYUSHU UNIVERSITY   (Japan)

^b POSTECH   (South Korea)

Author keywords

Deep X ray lithography; GPC; High aspect ratio; Open top microchannel plate; PMMA; SOI; Synchrotron radiation

Indexed keywords

LITHOGRAPHY; POLYMETHYL METHACRYLATES; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON ON INSULATOR TECHNOLOGY; SYNCHROTRON RADIATION; X RAY ANALYSIS;

MICROCHANNEL PLATES;

MASKS;

EID: 0041360415     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.4102     Document Type: Conference Paper

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