Real-time coverage monitoring of initial oxidation processes on Si(001) by means of surface differential reflectance

Journal of Physics Condensed Matter

Volumn 18, Issue 17, 2006, Pages

  Takizawa, J ^a   Ohno, S ^a   Koizumi, J ^a   Shudo, K ^a   Tanaka, M ^a  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; OXIDATION; PHOTONS; SPECTRUM ANALYSIS;

LANGMUIR-TYPE ADSORPTION; SURFACE DIFFERENTIAL REFLECTANCE;

SILICON;

EID: 33645977812     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/18/17/L01     Document Type: Article

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