Time evolution of interface roughness during thermal oxidation on Si(0 0 1)

Applied Surface Science

Volumn 190, Issue 1-4, 2002, Pages 20-25

  Takakuwa, Yuji ^a   Ishida, Fumiaki ^a   Kawawa, Takuo ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

AES; Oxide coverage; Real time monitoring; RHEED; Si thermal oxidation; Surface morphology

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ETCHING; INTERFACES (MATERIALS); MORPHOLOGY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SEMICONDUCTING SILICON; THERMOOXIDATION;

INTERFACE ROUGHNESS;

SURFACE ROUGHNESS;

EID: 0037042021     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00836-4     Document Type: Conference Paper

References (15)