Adsorption process of chlorine on Si(111)7×7 studies by surface differential reflectivity and second harmonic generation

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 4, 2002, Pages 1358-1364

  Tanaka, M ^a   Shirao, T ^a   Sasaki, T ^a   Shudo, K ^a   Washio, W ^a   Kaneko, N ^a  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CHEMICAL BONDS; POTENTIAL ENERGY; REACTION KINETICS; REFLECTION; SECOND HARMONIC GENERATION; SEMICONDUCTING SILICON; SPECTROSCOPIC ANALYSIS; THERMAL EFFECTS;

ADATOM DANGLING BONDS; RATE EQUATIONS; SURFACE DIFFERENTIAL REFLECTANCE SPECTROSCOPY; SURFACE DIFFERENTIAL REFLECTIVITY;

CHLORINE;

EID: 0036648372     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1484098     Document Type: Article

References (19)