Electron impact effects on the oxidation of Si(111) at 90 K

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 3, 2005, Pages 475-479

  Ohno, Shin Ya ^a   Yates Jr , John T ^a  

^a UNIVERSITY OF PITTSBURGH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BOMBARDMENT; ELECTRON IMPACT EFFECTS; OXIDATION KINETICS;

ADSORPTION; BINDING ENERGY; ELECTRONS; OXIDATION; REACTION KINETICS; SURFACE CHEMISTRY; TEMPERATURE DISTRIBUTION; ULTRAHIGH VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON COMPOUNDS;

EID: 31044435176     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1887198     Document Type: Article

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