PECVD of SiOxNyCzHw thin films from hexamethyldisilazane containing feed. investigation on chemical characteristics and aging behavior

Plasmas and Polymers

Volumn 2, Issue 1, 1997, Pages 25-40

  Fracassi, F ^a   Lamendola, R ^a  

^a UNIVERSITY OF BARI   (Italy)

Author keywords

Bias effect; Film aging; FTIR analysis; PECVD; Silazane containing films

Indexed keywords

AGING OF MATERIALS; AMMONIA; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION BOMBARDMENT; MOLECULAR STRUCTURE; NITROGEN; PLASMA APPLICATIONS; SILICON COMPOUNDS; THERMAL EFFECTS;

BIAS EFFECTS; HEXAMETHYLDISILAZANE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); POLYSILAZANE;

THIN FILMS;

EID: 0031094790     PISSN: 10840184     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02765658     Document Type: Article

References (2)

1. F. Fracassi, R. d'Agostino, and G. Bruno, Plasmas and Polymers l, 3 (1996).
2. R. d'Agostino, F. Fracassi, C. Pacifico, and P. Capezzuto, J. Appl. Phys. 71, 462 (1992).