SiC x N y , thin films alloys prepared by pulsed excimer laser deposition

Applied Surface Science

Volumn 127-129, Issue , 1998, Pages 564-568

  Machorro, R ^a   Samano, E C ^a   Soto, G ^b   Cota, L ^a  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^b CENTRO DE INVESTIGACIÓN CIENTÍFICA Y DE EDUCACIÓN SUPERIOR DE ENSENADA   (Mexico)

Author keywords

Ellipsometry; Laser ablation; SiCN alloys

Indexed keywords

DEPOSITION; ELLIPSOMETRY; ENERGY GAP; EXCIMER LASERS; FILM GROWTH; LASER ABLATION; PRESSURE EFFECTS; PULSED LASER APPLICATIONS; SINTERING; STOICHIOMETRY; THIN FILMS;

PULSED EXCIMER LASER DEPOSITION; REAL TIME KINETIC ELLIPSOMETRY; TAUC'S PLOT;

SILICON ALLOYS;

EID: 0032075556     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)00706-X     Document Type: Article

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