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Volumn 24, Issue 1, 2006, Pages 30-40

Plasma etching of HfO 2 at elevated temperatures in chlorine-based chemistry

Author keywords

[No Author keywords available]

Indexed keywords

ARRHENIUS LAW; PATTERNED WAFERS; POLYSILICON GATE;

EID: 29344451971     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2134707     Document Type: Article
Times cited : (22)

References (31)
  • 8
    • 29344431809 scopus 로고    scopus 로고
    • Microelectronics Research Center, The University of Texas at Austin 4th Annual Topical Research Conference on Reliability, 30October
    • J. C. Lee, Microelectronics Research Center, The University of Texas at Austin 4th Annual Topical Research Conference on Reliability, 30October (2000).
    • (2000)
    • Lee, J.C.1
  • 9
    • 29344458724 scopus 로고    scopus 로고
    • International Sematech, IEEE
    • Y. Kim International Sematech, IEEE (2001).
    • (2001)
    • Kim, Y.1
  • 26
    • 84858520904 scopus 로고    scopus 로고
    • http://www.sgte.org/ substance database V. 10


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.