Etch characteristics of HfO 2 films on Si substrates

Applied Surface Science

Volumn 187, Issue 1-2, 2002, Pages 75-81

  Norasetthekul, S ^a   Park, P Y ^a   Baik, K H ^a   Lee, K P ^a   Shin, J H ^a   Jeong, B S ^a   Shishodia, V ^a   Norton, D P ^a   Pearton, S J ^a  

^a UNIVERSITY OF FLORIDA   (United States)

Author keywords

Etch rates; HfO 2 films; Plasma; Si substrates

Indexed keywords

ETCHING; HAFNIUM COMPOUNDS; PHOTORESISTS; PLASMAS; SILICON; SUBSTRATES; SURFACES;

ETCH RATES;

THIN FILMS;

EID: 0037075242     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00792-9     Document Type: Article

References (20)