Mix-and-match interferometric and optical lithographies for nanoscale structures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 406-413

  Zaidi, Saleem H ^a   Brueck, S R J ^a   Hill, T ^a   Shagam, R N ^a  

^a UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

Interferometric techniques; Lithography; Moir alignment; Nanoscale structures

Indexed keywords

ABERRATIONS; INTEGRATED CIRCUITS; INTERFEROMETRY; PHOTOLITHOGRAPHY; SILICON WAFERS;

OPTICAL IMAGING;

NANOSTRUCTURED MATERIALS;

EID: 0032402826     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309575     Document Type: Conference Paper

References (22)

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