Spatial frequency analysis of optical lithography resolution enhancement techniques

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 3, 1999, Pages 908-920

  Brueck, S R J ^a  

^a UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22644450219     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590669     Document Type: Article

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